Photoelectron diffraction study of the low-temperature low-coverage oxygen layer on Rh(110)

被引：19

作者：

Bondino, F ^{[1
]}

Comelli, G

Baraldi, A

Rosei, R

Lizzit, S

Goldoni, A

Larciprete, R

Paolucci, G

机构：

[1] Univ Trieste, Dipartimento Fis, I-34127 Trieste, Italy

[2] INFM, Lab TASC, I-34012 Trieste, Italy

[3] Sincrotrone Trieste, SCPA, I-34012 Trieste, Italy

[4] ENEA, Div Fis Applicata, I-00044 Frascati, RM, Italy

来源：

PHYSICAL REVIEW B | 2002年 / 66卷 / 07期

关键词：

D O I：

10.1103/PhysRevB.66.075402

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The local adsorption geometry of the low-coverage, short-range-ordered layer formed upon oxygen adsorption on the Rh(110) surface at 120 K has been quantitatively characterized by photoelectron diffraction measurements and multiple-scattering cluster calculations. The results of the structural analysis are compatible with a model where the oxygen atoms are located in the symmetric or slightly asymmetric short-bridge sites of the unreconstructed Rh(110) surface. O adsorption induces a small increase of the first substrate interlayer distance with respect to the relaxation of the clean Rh(110) surface.

引用

收藏

页码：754021 / 754025

页数：5

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