First stages of platinum electroless deposition on silicon(100) from hydrogen fluoride solutions studied by AFM

被引:44
作者
Gorostiza, P
Servat, J
Morante, JR
Sanz, F
机构
[1] UNIV BARCELONA,FAC QUIM,DEPT QUIM FIS,E-08028 BARCELONA,SPAIN
[2] UNIV BARCELONA,FAC FIS,DEPT FIS APLICADA & ELECTR,LCMM,E-08028 BARCELONA,SPAIN
关键词
platinum; deposition process; silicon; atomic force microscopy;
D O I
10.1016/0040-6090(95)07009-5
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The first stages of platinum electroless deposition on p-Si (100) from hydrogen fluoride (HF) solutions are studied by atomic force microscopy (AFM), transmission electron microscopy (TEM), electron dispersive spectroscopy (EDS) and X-ray photoelectron spectroscopy (XPS). Platinum nuclei are deposited on a silicon substrate by simple immersion in an aqueous HF solution containing a platinum salt. Tapping-mode AFM and TEM have been used to characterize the samples morphologically, and EDS and XPS to identify the chemical nature of the main features. Platinum silicide formation has been detected for the first time in this kind of process, suggesting a competition between the deposition of pure metal and the formation of its silicide.
引用
收藏
页码:12 / 17
页数:6
相关论文
共 15 条
  • [1] ARNOLD AF, 1974, Patent No. 3857733
  • [2] NICKEL PLATING ON STEEL BY CHEMICAL REDUCTION
    BRENNER, A
    RIDDELL, GE
    [J]. JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS, 1946, 37 (01): : 31 - 34
  • [3] INFRARED-SPECTROSCOPY OF SI(111) SURFACES AFTER HF TREATMENT - HYDROGEN TERMINATION AND SURFACE-MORPHOLOGY
    BURROWS, VA
    CHABAL, YJ
    HIGASHI, GS
    RAGHAVACHARI, K
    CHRISTMAN, SB
    [J]. APPLIED PHYSICS LETTERS, 1988, 53 (11) : 998 - 1000
  • [4] DEEP ULTRAVIOLET LITHOGRAPHY OF MONOLAYER FILMS WITH SELECTIVE ELECTROLESS METALLIZATION
    CALVERT, JM
    CHEN, MS
    DULCEY, CS
    GEORGER, JH
    PECKERAR, MC
    SCHNUR, JM
    SCHOEN, PE
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1992, 139 (06) : 1677 - 1680
  • [5] CALVERT JM, 1991, SOLID STATE TECHNOL, V34, P77
  • [6] ELECTROLESS CU FOR VLSI
    CHO, JSH
    KANG, HK
    WONG, SS
    SHACHAMDIAMAND, Y
    [J]. MRS BULLETIN, 1993, 18 (06) : 31 - 38
  • [7] CHYAN OMR, 1994, 185 M EL SOC SAN FRA
  • [8] MORPHOLOGY OF HYDROGEN-TERMINATED SI(111) AND SI(100) SURFACES UPON ETCHING IN HF AND BUFFERED-HF SOLUTIONS
    DUMAS, P
    CHABAL, YJ
    JAKOB, P
    [J]. SURFACE SCIENCE, 1992, 269 : 867 - 878
  • [9] HIGASHI GS, 1993, P 2 S PHYS CHEM SIO2
  • [10] ELECTROLESS COPPER DEPOSITION ON METALS AND METAL SILICIDES
    MAK, CY
    [J]. MRS BULLETIN, 1994, 19 (08) : 55 - 61