In situ detection of faradaic current in probe oxidation using a dynamic force microscope

被引：29

作者：

Kuramochi, H

Ando, K

Tokizaki, T

Yokoyama, H

机构：

[1] Natl Inst Adv Ind Sci & Technol, Res Consortium Synth Nanofunct Mat Project, Tsukuba, Ibaraki 3058562, Japan

[2] SII Nanotechnol Inc, Tsukuba, Ibaraki 3058562, Japan

[3] SUNAF, AIST, Tsukuba, Ibaraki 3058568, Japan

[4] NRI, AIST, Tsukuba, Ibaraki 3058568, Japan

来源：

APPLIED PHYSICS LETTERS | 2004年 / 84卷 / 20期

关键词：

D O I：

10.1063/1.1748842

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A faradaic current on the order of a sub-pico-ampere was detected while fabricating two-dimensional oxide nanostructures on H-passivated Si(001) surfaces. The detected faradaic current has been shown to faithfully reflect the degree of probe oxidation with a clear dependence on the variation of voltage and the tip speed. The faradaic current in dynamic mode can serve as a sensitive monitor of the nano-oxidation reaction for implementing precise closed-loop control of the oxide growth. (C) 2004 American Institute of Physics.

引用

页码：4005 / 4007

页数：3

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