Recent advances in processing of ZnO

被引:623
作者
Pearton, SJ [1 ]
Norton, DP
Ip, K
Heo, YW
Steiner, T
机构
[1] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
[2] Air Force Off Sci Res, Arlington, VA 22217 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2004年 / 22卷 / 03期
关键词
D O I
10.1116/1.1714985
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A review is given of recent results in developing improved fabrication processes for ZnO devices with the possible application to UV light emitters, spin functional devices, gas sensors, transparent electronics, and surface acoustic wave devices. There is also interest in integrating ZnO with other wide band-gap semiconductors, such as the AlInGaN system. In this article, we. summarize recent progress in controlling n- and p-type doping, materials processing methods, such as ion implantation for doping or isolation, Ohmic and Schottky contact formation, plasma etching, the role of hydrogen in the background n-type conductivity of many ZnO films, and finally, the recent achievement of room-temperature ferromagnetism in transition-metal (Mn or Co)-doped ZnO. This may lead to another class of spintronic devices, in which the spin of the carriers is exploited rather than the charge as in more conventional structures. (C) 2004 American Vacuum Society.
引用
收藏
页码:932 / 948
页数:17
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