Excimer-laser ablation and micro-patterning of ceramic Si3N4

被引：40

作者：

Heitz, J ^{[1
]}

Pedarnig, JD ^{[1
]}

Bauerle, D ^{[1
]}

Petzow, G ^{[1
]}

机构：

[1] MPI MET FORSCH,INST WERKSTOFFWISSENSCH,D-70569 STUTTGART,GERMANY

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1997年 / 65卷 / 03期

关键词：

D O I：

10.1007/s003390050575

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Excimer-laser ablation and micro-patterning of ceramic Si3N4 has been investigated. The ablation threshold in air, Phi(th), is around 0.3 +/- 0.1 J/cm(2) with ArF- and 0.9 +/- 0.2 J/cm(2) with KrF-laser radiation. With fluences Phi(th) < Phi less than or equal to 4 J/cm(2) the irradiated surface is either very flat or it ex hibits a cone-type structure, depending on the number of laser pulses employed. With fluences of 5 to 10 J/cm(2), the sample surface becomes very smooth, much smoother than the original mechanically polished surface. Pores, scratches, and cracks observed on the non-irradiated surface are absent within the illuminated area. In this regime, the ablation rates are typically 0.1 to 0.2 mu m/pulse.

引用

页码：259 / 261

页数：3

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