Impact of deep submicron technology on dependability of VLSI circuits

被引:105
作者
Constantinescu, C [1 ]
机构
[1] Intel Corp, Hillsboro, OR 97124 USA
来源
INTERNATIONAL CONFERENCE ON DEPENDABLE SYSTEMS AND NETWORKS, PROCEEDINGS | 2002年
关键词
D O I
10.1109/DSN.2002.1028901
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
Advances in semiconductor technology have led to impressive performance gains of VLSI circuits, in general, and microprocessors, in particular. However, smaller transistor and interconnect dimensions, lower power voltages, and higher operating frequencies have contributed to increased rates of occurrence of transient and intermittent faults. In this paper we address the impact of deep submicron technology on permanent, transient and intermittent classes of faults, and discuss the main trends in circuit dependability. Two case studies exemplify this analysis. The first one deals with intermittent faults induced by manufacturing residuals. The second case study shows that transients generated by timing violations are capable of silently corrupting data. It is concluded that semiconductor industry is approaching a new stage in the design and manufacturing of VLSI circuits. Fault-tolerance features, specific to custom designed computers, have to be integrated into commercial-off-the-shelf (COTS) VLSI systems in the future, in order to preserve data integrity and limit the impact of transient and intermittent faults.
引用
收藏
页码:205 / 209
页数:5
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