Proximity effects in free-standing EBID structures

被引：16

作者：

Burbridge, Daniel J. ^{[1
]}

Gordeev, Sergey N. ^{[1
]}

机构：

[1] Univ Bath, Dept Phys, Bath BA2 7AY, Avon, England

来源：

NANOTECHNOLOGY | 2009年 / 20卷 / 28期

基金：

英国工程与自然科学研究理事会;

关键词：

BEAM-INDUCED-DEPOSITION; CHEMICAL-VAPOR-DEPOSITION; SCANNING ELECTRON-MICROSCOPE; SCALE CARBON STRUCTURES; FOCUSED-ION-BEAM; RESOLUTION; NANOTUBES; FILMS; NANOSTRUCTURES; LITHOGRAPHY;

D O I：

10.1088/0957-4484/20/28/285308

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Proximity effects causing thickening and bending of closely spaced, free-standing pillars grown by electron-beam-induced deposition are investigated. It is shown that growth of a new pillar induces deposition of a layer of additional material on the side of already grown pillars facing the new pillar. We present experimental results which suggest that the bending of pillars is caused by shrinkage of the newly formed layer on exposure to the primary electron beam.

引用

页数：6

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