Electron beam induced deposition of rhodium from the precursor [RhCl(PF3)2]2:: morphology, structure and chemical composition

被引:23
作者
Cicoira, F
Leifer, K
Hoffmann, P
Utke, I
Dwir, B
Laub, D
Buffat, PA
Kapon, E
Doppelt, P
机构
[1] Swiss Fed Inst Technol, Adv Photon Lab, EPFL, CH-1015 Lausanne, Switzerland
[2] Swiss Fed Inst Technol, Inst Quantum Elect & Photon, EPFL, CH-1015 Lausanne, Switzerland
[3] Swiss Fed Inst Technol, Cent Facil Elect Microscopy, EPFL, CH-1015 Lausanne, Switzerland
[4] CNRS, Ecole Super Phys & Chim Ind, F-75231 Paris 05, France
关键词
chemical vapor deposition processes; nano-materials; electron energy loss spectroscopy; transmission electron microscopy;
D O I
10.1016/j.jcrysgro.2004.02.006
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We have studied the morphology, the Structure and the chemical composition of micro- and nano-structures grown by electron beam-induced deposition of [RhCl(PF3)(2)](2). Transmission electron microscopy revealed that the deposits are made up of face centered cubic crystalline Rh grains (4-6 nm in diameter) immersed in an amorphous matrix. Auger electron spectroscopy and electron energy loss spectroscopy showed that a carbon contamination layer is present at the deposit surface, while the bulk material contains the elements Rh (60at%), P (20at%), Cl, O and N (remaining 20 at%). The structure. the chemical composition of the deposits and the size of the Rh nano-crystals are independent of the deposit shape and of the deposition parameters, within the range explored in this work. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:619 / 626
页数:8
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