ELECTRON-BEAM DEPOSITION OF GOLD NANOSTRUCTURES IN A REACTIVE ENVIRONMENT

被引:77
作者
FOLCH, A [1 ]
TEJADA, J [1 ]
PETERS, CH [1 ]
WRIGHTON, MS [1 ]
机构
[1] UNIV BARCELONA,FAC FIS,E-08027 BARCELONA,SPAIN
关键词
D O I
10.1063/1.113909
中图分类号
O59 [应用物理学];
学科分类号
摘要
Electron beam deposition (EBD) is a maskless technique suitable for the fabrication of nanometer scale structures. Metals can be deposited from an organometallic gas, but simultaneous carbon deposition typically yields grossly impure (∼25% metal) deposits. We have found that the metal content of the deposited solid is dramatically improved by performing the whole EBD process in a reactive gaseous environment containing a source of oxygen (O2orH2O) in addition to the organometallic gas. With simple procedures we prepared Au deposits showing significantly diminished C content (up to 50% metal) as the partial pressure of O2 (or H2O) is increased in the gas.© 1995 American Institute of Physics.
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页码:2080 / 2082
页数:3
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