DIRECT ELECTRON-BEAM PATTERNING FOR NANOLITHOGRAPHY

被引：57

作者：

LEE, KL

HATZAKIS, M

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 06期

关键词：

D O I：

10.1116/1.584652

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1941 / 1946

页数：6

共 9 条

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[4]

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[5]

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[6]

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[7] DIRECT DEPOSITION OF 10-NM METALLIC FEATURES WITH THE SCANNING TUNNELING MICROSCOPE [J].

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KERN, DP ;

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[8] ELECTRON-SCATTERING BY GAS IN THE SCANNING ELECTRON-MICROSCOPE [J].

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[9] FOCUSED ION-BEAM INDUCED DEPOSITION OF GOLD [J].

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