ELECTRON-BEAM STIMULATED CHEMICAL VAPOR-DEPOSITION OF PATTERNED TUNGSTEN FILMS ON SI(100)

被引：20

作者：

JACKMAN, RB

FOORD, JS

机构：

来源：

APPLIED PHYSICS LETTERS | 1986年 / 49卷 / 04期

关键词：

D O I：

10.1063/1.97168

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：196 / 198

页数：3

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