Effect of UV and visible light radiation on the electrical performances of transparent TFTs based on amorphous indium zinc oxide

被引:92
作者
Barquinha, P.
Pimentel, A.
Marques, A.
Pereira, L.
Martins, R.
Fortunato, E.
机构
[1] Univ Nova Lisboa, Fac Sci & Technol, Dept Mat Sci, CENIMAT, P-2829516 Caparica, Portugal
[2] Univ Nova Lisboa, CEMOP, P-2829516 Caparica, Portugal
关键词
amorphous semiconductors; thin film transistors; sputtering; optical properties; photoinduced effects;
D O I
10.1016/j.jnoncrysol.2006.01.068
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Insensitivity to light irradiation is desirable for conventional applications of thin-film transistors, i.e., the active matrices of displays. However, if one produces a device presenting controlled sensitivity to light, many other applications can benefit or can even be created. In this work it is shown the influence of the photon energy on the optoelectronic properties presented by n-type bottom-gate thin-film transistors based on indium zinc oxide. In the dark, the devices present very good electrical properties, working in the enhancement model exhibiting on-off ratios higher than 10(7) and channel mobility above 30 cm(2)/V s. Remarkable results were achieved when the devices were exposed to light radiation, the most striking one is the possibility to switch between enhancement (in the dark) and depletion (illuminated) modes, with different threshold voltages and on/off ratios, function of the light power density and wavelength used. This type of behavior permits to design circuits where one can have the same transistor working either in the enhancement or depletion modes, function of the light beam and intensity impinging on it, highly important for short wavelength detector applications. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:1756 / 1760
页数:5
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