Investigation of GaN-based light emitting diodes with nano-hole patterned sapphire substrate (NHPSS) by nano-imprint lithography

被引:42
作者
Huang, H. W. [1 ,2 ]
Lin, C. H. [2 ]
Huang, J. K. [1 ]
Lee, K. Y. [2 ]
Lin, C. F. [3 ]
Yu, C. C. [2 ]
Tsai, J. Y. [2 ]
Hsueh, R. [2 ]
Kuo, H. C. [1 ]
Wang, S. C. [1 ]
机构
[1] Natl Chiao Tung Univ, Inst Electroopt Engn, Hsinchu 30050, Taiwan
[2] Luxtaltek Corp, Chunan 350, Miaoli, Taiwan
[3] Natl Chung Hsing Univ, Dept Mat Engn, Taichung 400, Taiwan
来源
MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS | 2009年 / 164卷 / 02期
关键词
GaN; Light emitting diodes (LEDs); Nano-hole patterned sapphire substrate (NHPSS); Nano-imprint lithography (NIL); OMNIDIRECTIONAL REFLECTOR; EFFICIENCY; LEDS; ENHANCEMENT; EXTRACTION;
D O I
10.1016/j.mseb.2009.07.006
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this paper, gallium-nitride (GaN)-based light-emitting diodes (LEDs) with nano-hole patterned sapphire (NHPSS) by nano-imprint lithography are fabricated and investigated. At an injection current of 20mA, the LED with NHPSS increased the light output power of the InGaN/GaN multiple quantum well LEDs by a factor of 1.33, and the wall-plug efficiency is 30% higher at 20mA indicating that the LED with NHPSS had larger light extraction efficiency. In addition, by examining the radiation patterns, the LED with NHPSS shows stronger light extraction with a wider view angle. These results offer promising potential to enhance the light output powers of commercial light-emitting devices using the technique of nano-imprint lithography. (C) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码:76 / 79
页数:4
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