Analysis of drying shrinkage and flow due to surface tension of spin-coated films on topographic substrates

被引:15
作者
Hirasawa, S [1 ]
Saito, Y [1 ]
Nezu, H [1 ]
Ohashi, N [1 ]
Maruyama, H [1 ]
机构
[1] HITACHI LTD,DEVICE DEV CTR,TOKYO 198,JAPAN
关键词
evaporative shrinkage; grooved substrate; planarization; SOG film; spin coating; surface tension flow;
D O I
10.1109/66.641486
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In semiconductor manufacturing processes, it is important that the SiO2 isolation films around aluminum connection lines have Bat surfaces in order to produce the multilayered connection lines used in high-density devices. In this paper, we analyzed transient changes, in the thickness distributions of a liquid-SOG (Spin-on-Glass) film on a two-dimensionally (2-D) grooved substrate during the evaporative shrinking process. The Bow due Co surface tension of the shrinking liquid film was calculated, Since the film is thin, a boundary layer approximation could be applied, and fourth-order differential equations of film thickness were solved using an iteration method. The viscosity and the shrinkage rate were assumed to he functions of the concentration of the solvent in the film, When the parameter of ratio [(surface tension)/{(viscosity) x (shrinking speed)}] is large and the width of the grooves is small, final surface undulations of the film are shallow, The effect of the centrifugal force was also analyzed.
引用
收藏
页码:438 / 444
页数:7
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