Directed growth of horizontal silicon nanowires by laser induced decomposition of silane

被引:5
作者
Abed, H. [1 ]
Charrier, A. [1 ]
Dallaporta, H. [1 ]
Safarov, V. [1 ]
Jamgotchian, H. [1 ]
Tonneau, D. [1 ]
机构
[1] Fac Sci Luminy, CRMC N, F-13288 Marseille 09, France
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2006年 / 24卷 / 03期
关键词
D O I
10.1116/1.2194948
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We present an original method to force the horizontal growth of silicon nanowires by laser assisted chemical vapor deposition of silane. The Ar+ laser beam, tightly focused on the absorbing sample, induces a local thermal horizontal gradient over the laser spot area, which determines the growth direction of the nanowires (NWs). The reaction of formation of Si NWs occurs via the vapor-liquid-solid process, when gold particles are spread on the surface to catalyze the reaction. The effect of laser power (i.e., of laser induced local temperature) and silane pressure on the morphology of the nanowires is presented. (c) 2006 American Vacuum Society.
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页码:1248 / 1253
页数:6
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