A dual-phase-lag diffusion model for predicting thin film growth

A dual-phase-lag diffusion ((DPLD) model, which extends Fick's law by including two lagging times, tau(j) for the mass flux vector and tau(rho), for the density gradient, is developed to predict thin film growth. Depending upon the phase lag ratio tau(rho)/tau(j), the DPLD model uniquely characterizes four types of growth kinetics as reported in the literature. The model validation with experimental data of silicon oxidation and Hg1-x,CdxTe film deposition demonstrates that the present model captures the anomalous behaviour of thin film growth from the very beginning of the process to relatively long times very well.