First realization and characterization of multilayer EUV reflective coatings

被引：5

作者：

Nicolosi, P ^{[1
]}

Patelli, A ^{[1
]}

Pelizzo, MG ^{[1
]}

Rigato, B ^{[1
]}

Maggioni, G ^{[1
]}

Depero, L ^{[1
]}

Bontempi, E ^{[1
]}

Mattei, G ^{[1
]}

Poletto, L ^{[1
]}

Mazzoldi, P ^{[1
]}

Tondello, G ^{[1
]}

机构：

[1] Univ Padua, Dipartimento Elettron & Informat, INFM, I-35131 Padua, Italy

来源：

SOFT X-RAY AND EUV IMAGING SYSTEMS II | 2001年 / 4506卷

关键词：

multilayer; EUV mirrors;

D O I：

10.1117/12.450947

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Experimental results on the realization of Mo/Si multilayer mirrors for EUV applications are presented. The multilayers have been deposited using RF-magnetron sputtering. The characterization of single layers and multilayers has been performed using different physical techniques. The reflectivity of multilayer mirrors optimised for 13 and 19 nm radiation has been measured and compared to simulation.

引用

页码：76 / 83

页数：8

共 10 条

[1] EUCLIDES: European EUVL program [J].

Benschop, JPH ;

van Dijsseldonk, AJJ ;

Kaiser, WM ;

Ockwell, DC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (06) :2978-2981

[2] Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography [J].

Mirkarimi, PB ;

Bajt, S ;

Wall, MA .

APPLIED OPTICS, 2000, 39 (10) :1617-1625

[3] EIT observation of the Extreme Ultraviolet Sun [J].

Moses, D ;

Clette, F ;

Delaboudiniere, JP ;

Artzner, GE ;

Bougnet, M ;

Brunaud, J ;

Carabetian, C ;

Gabriel, AH ;

Hochedez, JF ;

Millier, F ;

Song, XY ;

Au, B ;

Dere, KP ;

Howard, RA ;

Kreplin, R ;

Michels, DJ ;

Defise, JM ;

Jamar, C ;

Rochus, P ;

Chauvineau, JP ;

Marioge, JP ;

Catura, RC ;

Lemen, JR ;

Shing, L ;

Stern, RA ;

Gurman, JB ;

Neupert, WM ;

Newmark, J ;

Thompson, B ;

Maucherat, A ;

Portier-Fozzani, F ;

Berghmans, D ;

Cugnon, P ;

Van Dessel, EL ;

Gabryl, JR .

SOLAR PHYSICS, 1997, 175 (02) :571-599

[4] HIGH-RESOLUTION ELECTRON-MICROSCOPY STUDY OF X-RAY MULTILAYER STRUCTURES [J].

PETFORDLONG, AK ;

STEARNS, MB ;

CHANG, CH ;

NUTT, SR ;

STEARNS, DG ;

CEGLIO, NM ;

HAWRYLUK, AM .

JOURNAL OF APPLIED PHYSICS, 1987, 61 (04) :1422-1428

[5] Optical performance and characterization of an EUV and soft X-ray test facility [J].

Poletto, L ;

Boscolo, A ;

Tondello, G .

ULTRAVIOLET AND X-RAY DETECTION, SPECTROSCOPY, AND POLARIMETRY III, 1999, 3764 :94-102

[6]

Spiller E., 1988, Physics, Fabrication and Applications of Multilayered Strutures. Proceedings of a NATO Advanced Study Institute, P271

[7] EVALUATION OF LARGE-AREA MO/SI MULTILAYER SOFT-X-RAY MIRRORS FABRICATED BY RF MAGNETRON SPUTTERING [J].

TAKENAKA, H ;

KAWAMURA, T ;

HAGA, T ;

KINOSHITA, H ;

ISHII, Y .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1995, 34 (9A) :5027-5031

[8]

Vitta S, 1997, CURR SCI INDIA, V73, P429

[9] CALCULATION OF DEPOSITION RATES IN DIODE SPUTTERING SYSTEMS [J].

WESTWOOD, WD .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (01) :1-9

[10] IMD - Software for modeling the optical properties of multilayer films [J].

Windt, DL .

COMPUTERS IN PHYSICS, 1998, 12 (04) :360-370

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