EVALUATION OF LARGE-AREA MO/SI MULTILAYER SOFT-X-RAY MIRRORS FABRICATED BY RF MAGNETRON SPUTTERING

被引：25

作者：

TAKENAKA, H ^{[1
]}

KAWAMURA, T ^{[1
]}

HAGA, T ^{[1
]}

KINOSHITA, H ^{[1
]}

ISHII, Y ^{[1
]}

机构：

[1] NIPPON TELEGRAPH & TEL PUBL CORP, LSI LABS, ATSUGI, KANAGAWA 24301, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1995年 / 34卷 / 9A期

关键词：

MULTILAYER MIRROR; SOFT X-RAY; REFLECTIVITY; LARGE-AREA DEPOSITION; UNIFORMITY;

D O I：

10.1143/JJAP.34.5027

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

It was determined by calculation that the soft X-ray reflectivities of Tc/Si, Mo/Si, Nb/Si, and Ru/Si multilayers are highest at 13 nm wavelength. Six-inch-diameter Mo/Si multilayers, selected from among these multilayers, were fabricated by an rf magnetron sputtering system. Their periodic length uniformity was good (better than +/-1% deviation over the entire surface area) and the layer interfaces were fairly well defined. Reflectivity of 63% at around 13.7 nm wavelength was achieved at 3-degrees from normal incidence. Large-area high-quality multilayer mirrors for soft X-ray projection lithography can thus be fabricated using this rf magnetron sputtering system.

引用

页码：5027 / 5031

页数：5

共 26 条

[1]

Barbee TW, 1985, P SPIE, V563, P2, DOI [10.1117/12.949647, DOI 10.1117/12.949647]

[2] REDUCTION IMAGING AT 14 NM USING MULTILAYER-COATED OPTICS - PRINTING OF FEATURES SMALLER THAN 0.1-MU-M [J].

BJORKHOLM, JE ;

BOKOR, J ;

EICHNER, L ;

FREEMAN, RR ;

GREGUS, J ;

JEWELL, TE ;

MANSFIELD, WM ;

MACDOWELL, AA ;

RAAB, EL ;

SILFVAST, WT ;

SZETO, LH ;

TENNANT, DM ;

WASKIEWICZ, WK ;

WHITE, DL ;

WINDT, DL ;

WOOD, OR ;

BRUNING, JH .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1990, 8 (06) :1509-1513

[3]

Bruijn M. P., 1985, Proceedings of the SPIE - The International Society for Optical Engineering, V563, P36, DOI 10.1117/12.949649

[4]

CEGLIO NM, 1991, OSA PROC, V12, P5

[5]

Di Nardo R. P., 1985, Proceedings of the SPIE - The International Society for Optical Engineering, V563, P30, DOI 10.1117/12.949648

[6]

Henke B L, 1988, LBL26259

[7]

JANKOWSKI AF, 1990, P SOC PHOTO-OPT INS, V1343, P32

[8]

JANKOWSKI AF, 1991, P SOC PHOTO-OPT INS, V1357, P14

[9] SOFT-X-RAY REDUCTION LITHOGRAPHY USING MULTILAYER MIRRORS [J].

KINOSHITA, H ;

KURIHARA, K ;

ISHII, Y ;

TORII, Y .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06) :1648-1651

[10] SOFT-X-RAY REDUCTION LITHOGRAPHY USING MULTILAYER MIRRORS [J].

KINOSHITA, H ;

KURIHARA, K ;

TAKENAKA, H .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1991, 30 (11B) :3048-3052

← 1 2 3 →