SOFT-X-RAY REDUCTION LITHOGRAPHY USING MULTILAYER MIRRORS

被引：16

作者：

KINOSHITA, H ^{[1
]}

KURIHARA, K ^{[1
]}

TAKENAKA, H ^{[1
]}

机构：

[1] NIPPON TELEGRAPH & TEL PUBL CORP, MUSASHINO ELECT COMMUN LAB, INTERDISCIPLINARY RES LABS, MUSASHINO, TOKYO 180, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1991年 / 30卷 / 11B期

关键词：

SOFT X-RAY; MULTILAYER; REDUCTION; REFLECTION MASK; MIRROR OPTICS; MO/SI; SYNCHROTRON RADIATION;

D O I：

10.1143/JJAP.30.3048

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A feasibility study of soft X-ray reduction lithography using multilayer mirrors has been performed. An exposure wavelength range of 80 to 110 angstrom is proposed as the most suitable with current technology considering the optic design, the reflectivity of the multilayer, and the resist characteristics. With the aim of providing multilayers with very sharp interfaces and high reflectivity, we attempted to improve the multilayer fabrication process, with one result being the fabrication of an amorphous Mo/Si multilayer, by controlling substrate temperature. Experimental results of 0.2-mu-m pattern replication using a multilayer reflection mask are presented.

引用

页码：3048 / 3052

页数：5

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