SOFT-X-RAY PROJECTION LITHOGRAPHY

被引：16

作者：

CEGLIO, NM

HAWRYLUK, AM

STEARNS, DG

GAINES, DP

ROSEN, RS

VERNON, SP

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1990年 / 8卷 / 06期

关键词：

D O I：

10.1116/1.584912

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Recent advances in x-ray optics have made possible the practical consideration of soft x-ray projection imaging for the fabrication of high density integrated circuits.

引用

页码：1325 / 1328

页数：4

共 7 条

[1] REDUCTION IMAGING AT 14 NM USING MULTILAYER-COATED OPTICS - PRINTING OF FEATURES SMALLER THAN 0.1-MU-M
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JEWELL, TE
MANSFIELD, WM
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WASKIEWICZ, WK
WHITE, DL
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1990, 8 (06): : 1509 - 1513
[2] Ceglio N M, 1989, J Xray Sci Technol, V1, P7, DOI 10.3233/XST-1989-1103
[3] SOFT-X-RAY PROJECTION LITHOGRAPHY USING AN X-RAY REDUCTION CAMERA
HAWRYLUK, AM
SEPPALA, LG
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06): : 2162 - 2166
[4] REFLECTION MASK TECHNOLOGY FOR X-RAY PROJECTION LITHOGRAPHY
HAWRYLUK, AM
CEGLIO, NM
GAINES, DP
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06): : 1702 - 1704
[5] Hoh K., 1985, B ELECTROTECH LAB, V49, P47
[6] Lai B., 1985, Proceedings of the SPIE - The International Society for Optical Engineering, V563, P174, DOI 10.1117/12.949666
[7] STEARNS D, COMMUNICATION

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