Low temperature deposition of epitaxial titanium carbide on MgO(001) by co-evaporation of C-60 and Ti

被引:23
作者
Norin, L
McGinnis, S
Jansson, U
Carlsson, JO
机构
[1] Department of Inorganic Chemistry, Ångström Laboratory, Uppsala University, P. O. Box 538
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1997年 / 15卷 / 06期
关键词
D O I
10.1116/1.580850
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Films of epitaxial titanium carbide were grown on MgO(001) at 400 and 500 degrees C using a novel method based on the co-evaporation of Ti and C-60. Mirrorlike, adhesive films of TiC1-x (0.2<x<0.4) were deposited at growth rates of approximately 0.1 mu m/h. X-ray diffraction showed that the crystal orientation relationship between the film and the substrate was TiC(001)//MgO(001) and TiC[100]//MgO[100]. Transmission electron microscopy and low energy electron diffraction were also used to verify the epitaxial growth of the films. (C) 1997 American Vacuum Society. [S0734-2101(97)03606-3].
引用
收藏
页码:3082 / 3085
页数:4
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