Changes in surface band bending, surface work function, and sheet resistance of undoped ZnO films due to (NH4)2Sx treatment

被引：30

作者：

Lin, Yow-Jon ^{[1
]}

Tsai, Chia-Lung

机构：

[1] Natl Changhua Univ Educ, Inst Phototon, Changhua 500, Taiwan

[2] Natl Changhua Univ Educ, Dept Phys, Changhua 500, Taiwan

来源：

JOURNAL OF APPLIED PHYSICS | 2006年 / 100卷 / 11期

关键词：

D O I：

10.1063/1.2399894

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

In this study, the interaction of undoped ZnO films with (NH4)(2)S-x treatment have been investigated by x-ray photoelectron spectroscopy, photoluminescence, optical transmittance, and four-point probe. According to the experimental results, we find that the formation of Zn-S bonds and the reduction of oxygen vacancies (i.e., the S occupation of oxygen vacancies) near the ZnO surface might lead to an increase in the upward band bending, resulting in an increase in the sheet resistance and work function of ZnO. (c) 2006 American Institute of Physics.

引用

页数：4

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