Interferometric at-wavelength flare characterization of extreme ultraviolet optical systems

被引：7

作者：

Naulleau, P ^{[1
]}

Goldberg, KA

Gullikson, EM

Bokor, J

机构：

[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Ctr Xray Opt, Berkeley, CA 94720 USA

[2] Univ Calif Berkeley, Dept EECS, Berkeley, CA 94720 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1999年 / 17卷 / 06期

关键词：

D O I：

10.1116/1.590940

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The extreme ultraviolet (EUV) phase-shifting point diffraction interferometer (PS/PDI) has recently been developed to provide the high-accuracy wave-front characterization critical to the development of EUV lithography systems. Here we describe an enhanced implementation of the PS/PDI that significantly extends its measurement bandwidth. The enhanced PS/PDI is capable of simultaneously characterizing both wave front and flare. PS/PDI-based flare characterization of a recently fabricated EUV 10X-reduction lithographic optical system is presented. (C) 1999 American Vacuum Society. [S0734-211X(99)09206-9].

引用

页码：2987 / 2991

页数：5

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