Temperature dependent study of the microwave performance of 0.25-mu m gate GaAs MESFET's and GaAs pseudomorphic HEMT's

被引:23
作者
Feng, M
Scherrer, DR
Apostolakis, PJ
Kruse, JW
机构
[1] Dept. of Elec. and Comp. Engineering, Ctr. Compd. Semiconduct. M., University of Illinois, Urhana, IL
关键词
D O I
10.1109/16.502115
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report on the noise figure, associated gain, and the current gain cutoff frequency for comparable 0.25-mu m gate GaAs MESFET's and GaAs pseudomorphic HEMT's (p-HEMT's) as a function of cryogenic temperature, Contrary to previously published results which suggest that p-HEMT's should have a higher electron velocity and a lower noise figure than MESFET's due to the effects of the two-dimension electron gas (2-DEG), we have experimentally verified that this is not the case, We show clear evidence that the transport properties of the 2-DEG in p-HEMT's do not make a significant contribution to the speed enhancement and noise reduction during high-frequency operation of these devices, It is the fundamental InGaAs material properties, specifically the Gamma-L valley separation in the conduction band and associated effective mass of the electron in either GaAs or InGaAs channel, which limits the high-field electron velocity and thus the speed and noise performance of the devices.
引用
收藏
页码:852 / 860
页数:9
相关论文
共 37 条
[1]  
[Anonymous], QUANTUM THEORY ATOMS
[2]  
CHAO PC, 1988, IEEE T ELECTRON DEV, V35, P879
[3]  
DINGLE R, 1988, APPL PHYS LETT, V33, P1088
[4]  
ENOKI T, 1992, 4 INT C INP REL MAT, P15
[5]  
FENG M, 1984, APPL PHYS LETT, V44, P231, DOI 10.1063/1.94681
[6]   ION-IMPLANTED IN(X)GA(1-X) AS MESFETS ON GAAS SUBSTRATE FOR LOW-COST MILLIMETER-WAVE IC APPLICATION [J].
FENG, M ;
LAU, CL .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1992, 39 (03) :484-493
[7]   DOES THE 2-DIMENSIONAL ELECTRON-GAS EFFECT CONTRIBUTE TO HIGH-FREQUENCY AND HIGH-SPEED PERFORMANCE OF FIELD-EFFECT TRANSISTORS [J].
FENG, M ;
LAU, CL ;
EU, V ;
ITO, C .
APPLIED PHYSICS LETTERS, 1990, 57 (12) :1233-1235
[8]   ON THE SPEED AND NOISE PERFORMANCE OF DIRECT ION-IMPLANTED GAAS-MESFETS [J].
FENG, M ;
LASKAR, J .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1993, 40 (01) :9-17
[9]   STUDY OF CR, SI AND MN DISTRIBUTION IN SEMI-INSULATING GAAS AFTER ANNEALING WITH AND WITHOUT SIO2 IN AN H2-AS4 ATMOSPHERE [J].
FENG, M ;
EU, V ;
KANBER, H ;
HENDERSON, WB .
JOURNAL OF ELECTRONIC MATERIALS, 1981, 10 (06) :973-986
[10]   SILICON IMPLANTED SUPER LOW-NOISE GAAS-MESFET [J].
FENG, M ;
EU, VK ;
SIRACUSA, M ;
WATKINS, E .
ELECTRONICS LETTERS, 1982, 18 (01) :21-23