Focused ion beams in microsystem fabrication

被引：17

作者：

Daniel, JH

Moore, DF

Walker, JF

Whitney, JT

机构：

[1] Cambridge Univ. Eng. Department

[2] FEI Europe Ltd., Cottenham

来源：

MICROELECTRONIC ENGINEERING | 1997年 / 35卷 / 1-4期

关键词：

D O I：

10.1016/S0167-9317(96)00128-1

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Focused ion beam (FIB) systems are widely used in microelectronics for prototype modification, device failure analysis and process monitoring. With the growing importance of micro-electro-mechanical systems (MEMS) the question arises whether FIB can be successfully and economically applied to prototyping and production in that area.

引用

页码：431 / 434

页数：4

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