Influence of the angular distribution function of incident particles on the microstructure and anomalous scaling behavior of thin films

被引：42

作者：

Yanguas-Gil, A.

Cotrino, J.

Barranco, A.

Gonzalez-Elipe, A. R.

机构：

[1] Univ Seville, CSIC, Inst Ciencia Mat Sevilla, Seville 41092, Spain

[2] Dept Fis Atom Mol & Nucl, Seville 41092, Spain

[3] Univ Seville, Dept Quim Inorgan, Seville 41092, Spain

来源：

PHYSICAL REVIEW LETTERS | 2006年 / 96卷 / 23期

关键词：

D O I：

10.1103/PhysRevLett.96.236101

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The microstructure and the scaling properties of films grown by plasma enhanced chemical vapor deposition are reproduced with a discrete model that takes into account the angular distribution function of the particles and the lateral growth of the films. Both the experimental and simulated surfaces exhibit a granular microstructure and an anomalous scaling behavior characterized by values of the growth exponent beta that vary with the scale of measurement. Depending on the angular distribution function used in the model, values of beta ranging from 0.86 to 0.2 are obtained.

引用

页数：4

共 21 条

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