Critical Thickness and Radius for Axial Heterostructure Nanowires Using Finite-Element Method

被引:61
作者
Ye, Han [1 ,2 ]
Lu, Pengfei [1 ,2 ]
Yu, Zhongyuan [1 ,2 ]
Song, Yuxin [3 ]
Wang, Donglin [1 ,2 ]
Wang, Shumin [3 ]
机构
[1] Beijing Univ Posts & Telecommun, Inst Opt Commun & Optoelect, Beijing 100876, Peoples R China
[2] Beijing Univ Posts & Telecommun, Key Lab Opt Commun & Lightwave Technol, Minist Educ, Beijing 100876, Peoples R China
[3] Chalmers, Dept Microtechnol & Nanosci, Photon Lab, S-41296 Gothenburg, Sweden
基金
中国国家自然科学基金;
关键词
MISFIT DISLOCATIONS; STRAIN DISTRIBUTION; EPITAXIAL-GROWTH; GAAS; NANOHETEROEPITAXY; SUBSTRATE; WHISKERS; LAYER;
D O I
10.1021/nl900055x
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Finite-element methods are used to simulate a heterostructured nanowire grown on a compliant mesa substrate. The critical thickness is calculated based on the overall energy balance approach. The strain field created by the first pair of misfit dislocations, which offsets the initial coherent strain field, is simulated. The local residual strain is used to calculate the total residual strain energy. The three-dimensional model shows that there exists a radius-dependent critical thickness below which no misfit dislocations could be generated. Moreover, this critical thickness becomes infinity for a radius less than some critical values. The simulated results are in good agreement with the experimental data. The critical radius from this work is smaller than that obtained from previous models that omit the interaction between the initial coherent strain field and the dislocation-induced strain field.
引用
收藏
页码:1921 / 1925
页数:5
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