The self-assembly of uniform heteroepitaxial islands

被引：37

作者：

Chiu, CH ^{[1
]}

机构：

[1] Inst Mat Res & Engn, Singapore 119260, Singapore

来源：

APPLIED PHYSICS LETTERS | 1999年 / 75卷 / 22期

关键词：

D O I：

10.1063/1.125300

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We present simulation for the morphological evolution of a Stranski-Krastanow system during the annealing process. By considering the strain energy, the surface-energy anisotropy, and the film-substrate interaction, the simulation demonstrates that the morphological evolution of the system can lead to an array of nearly uniform islands that is stable against coarsening. The stability results from the suppression of strain energy relaxation by strong surface-energy anisotropy and strong film-substrate interaction. (C) 1999 American Institute of Physics. [S0003-6951(99)03548-2].

引用

页码：3473 / 3475

页数：3

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