Permeation barrier properties of thin oxide films on flexible polymer substrates

被引：146

作者：

Fahlteich, John ^{[1
]}

Fahland, Matthias ^{[1
]}

Schoenberger, Waldemar ^{[1
]}

Schiller, Nicolas ^{[1
]}

机构：

[1] Fraunhofer Inst Electron Beam & Plasma Technol, D-01277 Dresden, Germany

来源：

THIN SOLID FILMS | 2009年 / 517卷 / 10期

关键词：

Permeation barrier; Reactive sputtering; Magnetron-PECVD; Encapsulation; Flexible electronics; Zinc-tin-oxide; Aluminium oxide; DEPOSITION; ENCAPSULATION; COATINGS;

D O I：

10.1016/j.tsf.2008.11.089

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Solar cells and organic electronic devices require an encapsulation to ensure sufficient lifetime. Key parameters of the encapsulation are permeation barrier, UV stability, temperature stability, optical transmission spectra and mechanical stability. The requirements depend very much on the specific application. Many work groups suggest multilayer stacks to meet the permeation requirements. in this paper the permeation barrier properties of the different constituents of such a multilayer stack are characterized. Different layer materials are compared regarding their water vapour and oxygen permeability as well as the influence of process parameters is examined. Finally temperature dependent permeation measurements are used to characterize the permeation mechanisms in the different constituents of the multilayer barrier. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：3075 / 3080

页数：6

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