Mechanical durability of ultra-water-repellent thin film by microwave plasma-enhanced CVD

被引：55

作者：

Wu, YY

Bekke, M

Inoue, Y

Sugimura, H

Kitaguchi, H

Liu, CS

Takai, O

机构：

[1] Nagoya Univ, Ctr Integrated Res Sci & Engn, Chikusa Ku, Nagoya, Aichi 4648603, Japan

[2] Aichi Sci & Technol Fdn, Nagoya, Aichi 4600002, Japan

[3] Nagoya Univ, Res Ctr Nucl Mat Recycle, Nagoya, Aichi 4648603, Japan

[4] Nagoya Univ, Dept Mat Proc Engn, Nagoya, Aichi 4648603, Japan

[5] TOKAI RIKA CO LTD, Oguchi, Aichi 4800195, Japan

来源：

THIN SOLID FILMS | 2004年 / 457卷 / 01期

关键词：

ultra-water-repellency; mechanical durability; hard thin film; microwave plasma-enhanced CVD silicon dioxide;

D O I：

10.1016/j.tsf.2003.12.007

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Here we present the results of the mechanical properties of hard ultra-water-repellent film prepared by microwave plasma-enhanced CVD methods, using trimethylmethoxysilane (TMMOS) as a raw material and CO2 as an additive gas, and following by a hydrophobicity treatment. This study was focused on the influence of partial pressure of TMMOS and total pressure on the mechanical properties. The results showed that lower partial pressure was responsible for better mechanical properties but for a worse water repellency. The total pressure has a less effect on the mechanical properties but a more significant effect on the water repellency. The mechanical durability was also evaluated for films prepared on the optimal conditions. (C) 2003 Elsevier B.V. All rights reserved.

引用

页码：122 / 127

页数：6

共 26 条

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