Electronic structure and optical properties of silicon nanowires: A study using x-ray excited optical luminescence and x-ray emission spectroscopy

被引:90
作者
Sham, TK [1 ]
Naftel, SJ
Kim, PSG
Sammynaiken, R
Tang, YH
Coulthard, I
Moewes, A
Freeland, JW
Hu, YF
Lee, ST
机构
[1] Univ Western Ontario, Dept Chem, London, ON N6A 3B7, Canada
[2] Univ Saskatchewan, Canadian Light Source, Saskatoon, SK, Canada
[3] Univ Saskatchewan, Dept Phys, Saskatoon, SK, Canada
[4] Argonne Natl Lab, Adv Photon Source, Argonne, IL 60439 USA
[5] Univ Wisconsin, Ctr Synchrotron Radiat, Canadian Synchrotron Radiat Facil, Madison, WI 53589 USA
[6] City Univ Hong Kong, Dept Phys & Mat, Hong Kong, Hong Kong, Peoples R China
[7] City Univ Hong Kong, Ctr Super Diamond & Adv Films COSDAF, Hong Kong, Hong Kong, Peoples R China
来源
PHYSICAL REVIEW B | 2004年 / 70卷 / 04期
基金
美国国家科学基金会; 加拿大自然科学与工程研究理事会;
关键词
D O I
10.1103/PhysRevB.70.045313
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report a soft x-ray excited optical luminescence (XEOL) and x-ray emission spectroscopy (XES) study of silicon nanowires (SiNW) with excitations at the silicon K and L-3,L-2 edge, respectively. It is found that the XEOL of SiNW exhibits several luminescence bands at similar to460, similar to530, and similar to630 nm. These luminescence bands are broad and are sensitive to the Si 1s excitation channel (Si versus SiO2 whiteline). These chemical- and morphology-dependent luminescences are attributable to the emission from the encapsulating silicon oxide, the quantum-confined silicon crystallites of various sizes embedded in the oxide layer, and the silicon-silicon oxide interface. XES clearly shows the presence of a relatively thick oxide layer encapsulating the silicon nanowire and the densities of states tailing across the Fermi level. The implications of these findings to the electronic and optical properties of silicon nanowires are discussed.
引用
收藏
页码:045313 / 1
页数:8
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