Microstructural evolution of allylamine polymerized plasma films

被引：32

作者：

Lejeune, M ^{[1
]}

Brétagnol, F ^{[1
]}

Ceccone, G ^{[1
]}

Colpo, P ^{[1
]}

Rossi, F ^{[1
]}

机构：

[1] Commiss European Communities, Joint Res Ctr, IHCP, I-21020 Ispra, VA, Italy

来源：

SURFACE & COATINGS TECHNOLOGY | 2006年 / 200卷 / 20-21期

关键词：

physical vapour deposition (PVD); microstructure; Fourier transform infrared spectroscopy; polymers;

D O I：

10.1016/j.surfcoat.2005.09.003

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 [材料科学与工程]; 080502 [材料学];

摘要：

The present paper deals with the characterization of plasma polymerized allylamine films. The films were characterized using a large panel of techniques such as Fourier transformation infrared spectroscopy, X-ray photoemission spectroscopy and ellipsometry. The film microstructure was investigated as a function of the deposition power while other process parameters (gas mixture flow, pressure) were kept constant. The microstructure shows a strong dependence on the deposition power. A power transition has been identified outlining two deposition modes in agreement with a growth model developed for carbon nitride thin films. Conditions of deposition closed to this transition provide a film microstructure interesting for absorption and adhesion of biomolecules i.e. high NH2 content, high porosity and high deposition rate. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：5902 / 5907

页数：6

共 20 条

[1]

Infrared analysis of deuterated carbon-nitrogen films obtained by dual-ion-beam-assisted-deposition [J].

Alvarez, F ;

Victoria, NM ;

Hammer, P ;

Freire, FL ;

dos Santos, MC .

APPLIED PHYSICS LETTERS, 1998, 73 (08) :1065-1067

[2]

Plasma polymer films and their future prospects [J].

Biederman, H ;

Slavínská, D .

SURFACE & COATINGS TECHNOLOGY, 2000, 125 (1-3) :371-376

[3]

The influence of pulse parameters on film composition during pulsed plasma polymerization of diaminocyclohexane [J].

Choukourov, A ;

Biederman, H ;

Slavinska, D ;

Trchova, M ;

Hollander, A .

SURFACE & COATINGS TECHNOLOGY, 2003, 174 :863-866

[4]

Internal stress of sputtered amorphous carbon nitride thin films [J].

Durand-Drouhin, O ;

Benlahsen, M .

SOLID STATE COMMUNICATIONS, 2004, 131 (07) :425-429

[5]

Deposition mechanism of sputtered amorphous carbon nitride thin film [J].

Durand-Drouhin, O ;

Benlahsen, M ;

Clin, M ;

Bouzerar, R .

APPLIED SURFACE SCIENCE, 2004, 223 (04) :269-274

[6]

Electronic structure of hydrogenated carbon nitride films [J].

Hammer, P ;

Victoria, NM ;

Alvarez, F .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1998, 16 (05) :2941-2949

[7]

KAUFMAN H, 1989, PHYS REV B, V39, P13053

[8]

ANALYSIS OF PLASMA POLYMERIZATION OF ALLYLAMINE BY FTIR [J].

KRISHNAMURTHY, V ;

KAMEL, IL ;

WEI, Y .

JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 1989, 27 (04) :1211-1224

[9]

Properties of carbon nitride films deposited by magnetron sputtering [J].

Kusano, Y ;

Evetts, JE ;

Somekh, RE ;

Hutchings, IM .

THIN SOLID FILMS, 1998, 332 (1-2) :56-61

[10]

MONCLUS MA, 1999, THIN SOLIF FILMS, V79, P355

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