Improved vertical-scanning interferometry

被引：258

作者：

Harasaki, A ^{[1
]}

Schmit, J

Wyant, JC

机构：

[1] Univ Arizona, Ctr Opt Sci, Tucson, AZ 85721 USA

[2] Veeco Proc Metrol, Tucson, AZ 85706 USA

来源：

APPLIED OPTICS | 2000年 / 39卷 / 13期

关键词：

D O I：

10.1364/AO.39.002107

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We describe a method that combines phase-shifting and coherence-peak-sensing techniques to permit measurements with the height resolution of phase-shifting interferometry without the interval-slope limitation of lambda/4 per data sample of phase-shifting interferometry. A five-frame algorithm is used to determine both the best-focus frame position and the fractional phase from the best-focus frame of the correlogram acquired through vertical scanning. The two surface profiles retrieved from the phase and the modulation contrast of the correlograms are compared in the phase-unwrapping process to remove fringe-order ambiguity. (C) 2000 Optical Society of America.

引用

页码：2107 / 2115

页数：9

共 29 条

[1]

Ai C, 1997, US Patent, Patent No. 5633715

[2]

Balasubramanian N, 1980, U.S. patent, Patent No. [4,340,306, 4340306]

[3] INTERFEROMETRIC PROFILER FOR ROUGH SURFACES [J].

CABER, PJ .

APPLIED OPTICS, 1993, 32 (19) :3438-3441

[4] 2-WAVELENGTH PHASE-SHIFTING INTERFEROMETRY [J].

CHENG, YY ;

WYANT, JC .

APPLIED OPTICS, 1984, 23 (24) :4539-4543

[5] 3-DIMENSIONAL IMAGE REALIZATION IN INTERFERENCE MICROSCOPY [J].

CHIM, SSC ;

KINO, GS .

APPLIED OPTICS, 1992, 31 (14) :2550-2553

[6]

Cohen D., 1992, U.S. patent, Patent No. [5,133,601B2, 5133601]

[7] CALIBRATION OF NUMERICAL APERTURE EFFECTS IN INTERFEROMETRIC MICROSCOPE OBJECTIVES [J].

CREATH, K .

APPLIED OPTICS, 1989, 28 (16) :3333-3338

[8]

Creath K., 1988, Progress in optics. Vol.XXVI, P349, DOI 10.1016/S0079-6638(08)70178-1

[9] STEP HEIGHT MEASUREMENT USING 2-WAVELENGTH PHASE-SHIFTING INTERFEROMETRY [J].

CREATH, K .

APPLIED OPTICS, 1987, 26 (14) :2810-2816

[10]

Davidson M., 1987, Proceedings of the SPIE - The International Society for Optical Engineering, V775, P233, DOI 10.1117/12.940433

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