Pyramidal Si nanocrystals with a quasiequilibrium shape selectively grown on Si(001) windows in ultrathin SiO2 films

被引:28
作者
Shibata, M [1 ]
Nitta, Y [1 ]
Fujita, K [1 ]
Ichikawa, M [1 ]
机构
[1] Angstrom Technol Partnership, Joint Res Ctr Atom Technol, Tsukuba, Ibaraki 3050046, Japan
关键词
D O I
10.1103/PhysRevB.61.7499
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Pyramidal Si nanocrystals selectively grown on Si(001) windows in ultrathin 0.3-nm-thick SiO2 films were studied using in situ scanning tunneling microscopy. In the initial growth stage, {1, 1, 13} facets were formed on the four equivalent sidewalls of the crystal due to the repulsion force between neighboring steps. The crystals were stable with a quasiequilibrium shape when they were surrounded by the SiO2 film, but rapidly decayed once the boundary to the SiO2 film was removed. This indicates that Si adatoms were confined within the Si window area by the surrounding ultrathin SiO2 film and the Si adatom density became stationary. The confinement was; enabled by a difference in the adsorption energy of Si adatoms on SiO2 and these on Si(001).
引用
收藏
页码:7499 / 7504
页数:6
相关论文
共 27 条
[1]   FACET FORMATION MECHANISM OF SILICON SELECTIVE EPITAXIAL LAYER BY SI ULTRAHIGH-VACUUM CHEMICAL-VAPOR-DEPOSITION [J].
AOYAMA, T ;
IKARASHI, T ;
MIYANAGA, K ;
TATSUMI, T .
JOURNAL OF CRYSTAL GROWTH, 1994, 136 (1-4) :349-354
[2]   Low-energy electron microscopy study of step mobilities on Si(001) [J].
Bartelt, NC ;
Tromp, RM .
PHYSICAL REVIEW B, 1996, 54 (16) :11731-11740
[3]   Ostwald ripening of two-dimensional islands on Si(001) [J].
Bartelt, NC ;
Theis, W ;
Tromp, RM .
PHYSICAL REVIEW B, 1996, 54 (16) :11741-11751
[4]   The structure of silicon surfaces from (001) to (111) [J].
Baski, AA ;
Erwin, SC ;
Whitman, LJ .
SURFACE SCIENCE, 1997, 392 (1-3) :69-85
[5]   THE EQUILIBRIUM SHAPE OF SILICON [J].
BERMOND, JM ;
METOIS, JJ ;
EGEA, X ;
FLORET, F .
SURFACE SCIENCE, 1995, 330 (01) :48-60
[6]   STABILITIES OF SINGLE-LAYER AND BILAYER STEPS ON SI(001) SURFACES [J].
CHADI, DJ .
PHYSICAL REVIEW LETTERS, 1987, 59 (15) :1691-1694
[7]   EQUILIBRIUM SHAPE OF SI [J].
EAGLESHAM, DJ ;
WHITE, AE ;
FELDMAN, LC ;
MORIYA, N ;
JACOBSON, DC .
PHYSICAL REVIEW LETTERS, 1993, 70 (11) :1643-1646
[8]   Al adatom migration from the H-terminated to the bare area on Si(111) surfaces [J].
Enomoto, N ;
Hoshino, T ;
Hata, M ;
Tsuda, M .
APPLIED SURFACE SCIENCE, 1998, 130 :237-242
[9]   The effective charge in surface electromigration [J].
Fu, ES ;
Liu, DJ ;
Johnson, MD ;
Weeks, JD ;
Williams, ED .
SURFACE SCIENCE, 1997, 385 (2-3) :259-269
[10]   Nucleation along step edges during Si epitaxial growth on the Si(111)surface observed by STM [J].
Fujita, K ;
Kusumi, Y ;
Ichikawa, M .
SURFACE SCIENCE, 1997, 380 (01) :66-74