Low-resistivity ITO films by dc arc discharge ion plating for high duty LCDs

Low-resistivity, highly transparent indium tin oxide (ITO) films were prepared on glass and color filter substrates at. substrate temperatures below 200 degrees C, using the dc arc discharge ion plating (ADIP) technique. A resistivity of 1.07 x 10(-4) Omega cm was achieved with ITO films formed on glass and a resistivity of 1.20 x 10(-4) Omega cm was achieved on color tilters at a substrate temperature of 200 degrees C. The experiments were done using an in-line type vacuum coating system. We established production techniques suitable for mass production, with sheet resistance below 5 Omega/cm(2), and with a material erosion efficiency greater than 90%. (C) 1997 Elsevier Science B.V.