RF performance of surface channel diamond FETs with sub-micron gate length

被引:61
作者
Aleksov, A
Denisenko, A
Spitzberg, U
Jenkins, T
Ebert, W
Kohn, E
机构
[1] Univ Ulm, Dept Electron Devices & Circuits, D-89081 Ulm, Germany
[2] AFRL, SNDM, Wright Patterson AFB, OH 45433 USA
关键词
diamond properties and applications; surface-channel; FET; RF performance;
D O I
10.1016/S0925-9635(01)00644-6
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Diamond hydrogen-induced surface channel field effect transistors (FETs) were fabricated with gate lengths down to 0.2 mum in part using electron beam lithography. Down-scaling of the gate-length resulted in both improved DC- and RF characteristics, especially for a 0.2-mum gate length in a maximum output current of I-Dmax = 360 mA/mm with a peak transconductance of 148 mS/mm. The optimum cut-off frequencies were f(T) = 11.5 GHz, f(max(MAG)) = 31.7 GHz and f(max(U)) = 40,2 GHz. A maximum drain voltage of 68 V was obtained before pattern-related destructive breakdown occurred. This allows estimation of the RF power handling capability to above 3.0 W/mm. The data are the highest reported for diamond FETs. Scaling of the device parameters with gate length allows to estimate a velocity-limited maximum output current to 750 mA/mm and an fT above 20 GHz at 0.1-mum gate length. At high drive, current drift and current compression is observed in the quasi-DC output characteristics as well as in first microwave large signal measurements. These instabilities seem at present to be the main hurdle of hydrogen-induced surface channel FETs in high power microwave applications. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:382 / 386
页数:5
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