Effect of concentration of complexing agent on the spray deposited Bi2S3 thin films

被引:21
作者
Gadakh, SR [1 ]
Bhosale, CH [1 ]
机构
[1] Shivaji Univ, Dept Phys, Thin Film Phys Lab, Kolhapur 416004, Maharashtra, India
关键词
Bi2S3 thin films; spray pyrolysis; effect of concentration of EDTA;
D O I
10.1016/S0254-0584(99)00219-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Bi2S3 thin films have been prepared without complexing agent and with different concentrations of ethylene diamine tetra acetic acid (EDTA) as complexing agent by a spray pyrolysis technique. The effect of concentrations of complexing agent on the properties of Bi2S3 thin films is studied by characterizing the films by X-ray diffraction, scanning electron microscopy (SEM), optical absorption and dark electrical resistivity measurement techniques. These studies reveal that all films are polycrystalline. The band gap energy for as deposited films is observed to be 1.72 eV. However, the band gap energy is observed to be 2.0 eV for different concentrations of complexing agent. The electrical resistivity of the films with complexing agent is higher than that of the films prepared without complexing agent. The electrical resistivity also depends upon the concentration of the complexing agent. (C) 2000 Elsevier Science S.A, All rights reserved.
引用
收藏
页码:5 / 9
页数:5
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