Measurement of carbon atom density in high density plasma process

被引：13

作者：

Ito, H ^{[1
]}

Ikeda, M ^{[1
]}

Ito, M ^{[1
]}

Hori, M ^{[1
]}

Takeo, T ^{[1
]}

Hattori, H ^{[1
]}

Goto, T ^{[1
]}

机构：

[1] NAGOYA UNIV,DEPT QUANTUM ENGN,CHIKUSA KU,NAGOYA,AICHI 464,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1997年 / 36卷 / 7A期

关键词：

density; carbon atom; inductively coupled plasma; ultra-violet absorption spectroscopy; hollow cathode lamp;

D O I：

10.1143/JJAP.36.L880

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Carbon atom densities in an inductively coupled radio frequency (13.56 MHz) CO and CO and H-2 mixed plasmas were successfully measured for the first time using ultra-violet absorption spectroscopy (UVAS) with a carbon hollow cathode lamp. This method, developed for monitoring carbon atoms in-situ in the plasmas, is very useful for the investigation of etching and chemical vapor deposition (CVD) processes containing carbon atoms and the sputtering system employing a carbon target.

引用

页码：L880 / L882

页数：3

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