共 17 条
[3]
HIGH-RATE AND HIGHLY SELECTIVE SIO2 ETCHING EMPLOYING INDUCTIVELY-COUPLED PLASMA
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS,
1994, 33 (4B)
:2139-2144
[4]
FREE-RADICALS IN AN INDUCTIVELY-COUPLED ETCHING PLASMA
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS,
1994, 33 (4B)
:2157-2163
[6]
MEASUREMENTS OF THE CF RADICAL IN DC PULSED CF4/H2 DISCHARGE PLASMA USING INFRARED DIODE-LASER ABSORPTION-SPECTROSCOPY
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS,
1990, 29 (05)
:L829-L832
[8]
REACTIVE ION-BEAM ETCHING USING A BROAD BEAM ECR ION-SOURCE
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS,
1982, 21 (01)
:L4-L6
[9]
DIAGNOSTICS OF MICROWAVE PLASMA BY LASER-INDUCED FLUORESCENCE
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1986, 4 (03)
:1791-1794
[10]
SAKAI T, 1993, 15TH P S DRY PROC, P193