MEASUREMENTS OF THE CF RADICAL IN DC PULSED CF4/H2 DISCHARGE PLASMA USING INFRARED DIODE-LASER ABSORPTION-SPECTROSCOPY

被引：59

作者：

MAGANE, M ^{[1
]}

ITABASHI, N ^{[1
]}

NISHIWAKI, N ^{[1
]}

GOTO, T ^{[1
]}

YAMADA, C ^{[1
]}

HIROTA, E ^{[1
]}

机构：

[1] INST MOLEC SCI,OKAZAKI,AICHI 444,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1990年 / 29卷 / 05期

关键词：

CF radical density; CF/H2; plasma; Diffusion coefficient; Etching plasma; Infrared diode laser absorption spectroscopy;

D O I：

10.1143/JJAP.29.L829

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Infrared diode laser absorption spectroscopy (IRLAS) was established as the measurement method for the CF radical density. The absolute density of the CF radical and its pressure dependences were measured in DC pulsed CF4/H2 discharge plasma. Moreover, from the analysis of the decay parts of the observed transient absorption waveforms of the CF radical, the CF radical was shown to be removed mainly by a diffusion process in the present plasma, yielding the diffusion coefficients D(CF in H2) and D(CF in CF4). © 1990 The Japan Society of Applied Physics.

引用

页码：L829 / L832

页数：4

共 12 条

[1] LASER-INDUCED FLUORESCENCE DETECTION OF CF AND CF2 RADICALS IN A CF4/O2 PLASMA [J].