CHARACTERISTICS OF FLUOROCARBON RADICALS AND CHF3 MOLECULE IN CHF3 ELECTRON-CYCLOTRON-RESONANCE DOWNSTREAM PLASMA

The CF, CF2 and CF3 radical densities and CHF3 molecule density were measured in a CHF3 electron cyclotron resonance (ECR) downstream plasma using infrared diode laser absorption spectroscopy (IRLAS). The intensities of emission lines F*, Ar* and H alpha Were also measured in a CHF3/3% Ar ECR downstream plasma using optical emission spectroscopy (OES). These measurements were carried out as a function of the microwave power and the pressure with modulation of the power with an on-period of 15 ms and an off-period of 85 ms. On the basis of the results of IRLAS and OES measurements, the behaviors of the radicals in the ECR plasma have been investigated in detail.