Comparison of stress measurement techniques in surface micromachining

被引:36
作者
Elbrecht, L
Storm, U
Catanescu, R
Binder, J
机构
[1] Inst. Microsensors, Actuators, Syst., University of Bremen, D28334 Bremen
关键词
D O I
10.1088/0960-1317/7/3/019
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Stress measurement techniques using micromachined structures are compared with the wafer curvature technique. Buckling bridges and rotating indicator structures are simulated, designed and fabricated using thin polysilicon films. Stress ranging from the high compressive to the high tensile state can be detected using appropriate indicator designs.
引用
收藏
页码:151 / 154
页数:4
相关论文
共 10 条
  • [1] ELBRECHT L, 1997, IN PRESS SENS ACTU A
  • [2] Ericson F., 1995, 8th International Conference on Solid-State Sensors and Actuators and Eurosensors IX. Digest of Technical Papers (IEEE Cat. No.95TH8173), P84
  • [3] POST BUCKLING OF MICROMACHINED BEAMS
    FANG, W
    WICKERT, JA
    [J]. JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 1994, 4 (03) : 116 - 122
  • [4] Flinn P. A., 1989, Thin Films: Stresses and Mechanical Properties Symposium, P41
  • [5] Bent-beam strain sensors
    Gianchandani, YB
    Najafi, K
    [J]. JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 1996, 5 (01) : 52 - 58
  • [6] GOOSEN JFL, 1993, 7 INT C SOL STAT SEN, P783
  • [7] Guckel H., 1992, Journal of Micromechanics and Microengineering, V2, P86, DOI 10.1088/0960-1317/2/2/004
  • [8] A SIMPLE TECHNIQUE FOR THE DETERMINATION OF MECHANICAL STRAIN IN THIN-FILMS WITH APPLICATIONS TO POLYSILICON
    GUCKEL, H
    RANDAZZO, T
    BURNS, DW
    [J]. JOURNAL OF APPLIED PHYSICS, 1985, 57 (05) : 1671 - 1675
  • [9] Elastic properties and microstructure of LPCVD polysilicon films
    MaierSchneider, D
    Koprululu, A
    Holm, SB
    Obermeier, E
    [J]. JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 1996, 6 (04) : 436 - 446
  • [10] VANDRIIEENHUIZE.BP, 1993, SENS ACTUATORS A, V38, P756