Does a dipole layer at the p-i interface reduce the built-in voltage of amorphous silicon p-i-n solar cells?

被引:4
作者
Nuruddin, A [1 ]
Abelson, JR [1 ]
机构
[1] UNIV ILLINOIS,COORDINATED SCI LAB,DEPT MAT SCI & ENGN,URBANA,IL 61801
关键词
D O I
10.1063/1.120139
中图分类号
O59 [应用物理学];
学科分类号
摘要
The open-circuit voltage of amorphous silicon p-i-n solar cells is 0.1-0.3 V less than the total Fermi level shift in the p- and n-type layers. It was hypothesized that a dipole layer at the p-i interface reduces the potential drop across the i-layer. We determine the electrostatic potential profile using an in situ Kelvin probe during incremental depositions of p-type a-Si,C:H and undoped a-Si:H layers by direct current reactive magnetron sputtering. We confirm the existence of a dipole layer, but which produces a potential loss of only similar to 20 mV. Thus, most of the ''missing'' voltage in solar cells must have other origins. (C) 1997 American Institute of Physics. [S0003-6951(97)002145-1].
引用
收藏
页码:2797 / 2799
页数:3
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