ENERGETIC PARTICLE FLUXES IN MAGNETRON SPUTTER DEPOSITION OF A-SI-H

被引:15
作者
MYERS, AM [1 ]
DOYLE, JR [1 ]
FENG, GJ [1 ]
MALEY, N [1 ]
RUZIC, DL [1 ]
ABELSON, JR [1 ]
机构
[1] UNIV ILLINOIS,COORDINATED SCI LAB,URBANA,IL 61801
关键词
D O I
10.1016/S0022-3093(05)80237-6
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Reactive d.c. magnetron sputtering of a silicon target in a plasma of Ar plus H-2 produces high-quality a-Si:H films. This paper reports a study of the growth flux using mass spectrometry, plasma probes, and computer simulations to determine the identity, flux, energy distribution, and angular distribution of all incident species. Spectroscopic ellipsometry is used to deduce the bulk density of the films. The average energy delivered to the growing film is found to depend on the angle between the target normal and the substrate. The density of unhydrogenated a-Si films increases from 0.94 to 0.97 as the incident energy increases from 13 to 21 eV per deposited Si. The distributions of sputtered particles, of ions, and of fast H affect the film properties and merit continued study.
引用
收藏
页码:783 / 786
页数:4
相关论文
共 9 条
[1]  
ABELSON JR, AMORPHOUS SILICON TE
[2]  
FENG GF, AMORPHOUS SILICON TE
[3]   NEUTRAL RADICAL DEPOSITION FROM SILANE DISCHARGES [J].
GALLAGHER, A .
JOURNAL OF APPLIED PHYSICS, 1988, 63 (07) :2406-2413
[4]  
MALEY N, 1991, AMORPHOUS SILICON TE
[5]   MONTE-CARLO SIMULATIONS OF MAGNETRON SPUTTERING PARTICLE-TRANSPORT [J].
MYERS, AM ;
DOYLE, JR ;
ABELSON, JR ;
RUZIC, DN .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (03) :614-618
[6]  
MYERS AM, 1990, AMORPHOUS SILICON TE, V192, P595
[7]  
MYERS AM, 1991, THESIS U ILLINOIS
[8]   THE MICROSTRUCTURE OF SPUTTER-DEPOSITED COATINGS [J].
THORNTON, JA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :3059-3065
[9]   INVESTIGATION OF THE VOID STRUCTURE IN AMORPHOUS-GERMANIUM THIN-FILMS AS A FUNCTION OF LOW-ENERGY ION-BOMBARDMENT [J].
YEHODA, JE ;
YANG, B ;
VEDAM, K ;
MESSIER, R .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (03) :1631-1635