INVESTIGATION OF THE VOID STRUCTURE IN AMORPHOUS-GERMANIUM THIN-FILMS AS A FUNCTION OF LOW-ENERGY ION-BOMBARDMENT

被引:77
作者
YEHODA, JE
YANG, B
VEDAM, K
MESSIER, R
机构
[1] PENN STATE UNIV,DEPT PHYS,UNIVERSITY PK,PA 16802
[2] PENN STATE UNIV,DEPT ENGN SCI,UNIVERSITY PK,PA 16802
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期
关键词
D O I
10.1116/1.575341
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:1631 / 1635
页数:5
相关论文
共 26 条
[1]   DENSITY OF AMORPHOUS-GERMANIUM FILMS BY SPECTROSCOPIC ELLIPSOMETRY [J].
BLANCO, JR ;
MCMARR, PJ ;
YEHODA, JE ;
VEDAM, K ;
MESSIER, R .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03) :577-582
[2]  
BLANCO JR, 1985, MATER RES SOC S P, V38, P301
[3]   EFFECT OF ION-BOMBARDMENT DURING DEPOSITION ON THICK METAL AND CERAMIC DEPOSITS [J].
BLAND, RD ;
KOMINIAK, GJ ;
MATTOX, DM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04) :671-674
[4]   PROPERTY MODIFICATION AND SYNTHESIS BY LOW-ENERGY PARTICLE BOMBARDMENT CONCURRENT WITH FILM GROWTH [J].
CUOMO, JJ ;
ROSSNAGEL, SM .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 19-20 :963-974
[5]   TECHNOLOGY AND APPLICATIONS OF BROAD-BEAM ION SOURCES USED IN SPUTTERING .2. APPLICATIONS [J].
HARPER, JME ;
CUOMO, JJ ;
KAUFMAN, HR .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03) :737-756
[6]   QUANTITATIVE ION-BEAM PROCESS FOR THE DEPOSITION OF COMPOUND THIN-FILMS [J].
HARPER, JME ;
CUOMO, JJ ;
HENTZELL, HTG .
APPLIED PHYSICS LETTERS, 1983, 43 (06) :547-549
[7]   MODIFICATION OF THIN-FILM PROPERTIES BY ION-BOMBARDMENT DURING DEPOSITION [J].
HARPER, JME ;
CUOMO, JJ ;
GAMBINO, RJ ;
KAUFMAN, HR .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1985, 7-8 (MAR) :886-892
[8]   SPUTTERING YIELDS OF METALS FOR AR+ AND NE+ IONS WITH ENERGIES FROM 50 TO 600 EV [J].
LAEGREID, N ;
WEHNER, GK .
JOURNAL OF APPLIED PHYSICS, 1961, 32 (03) :365-&
[9]  
Leamy H. J., 1980, Current topics in materials science. Vol.6, P309
[10]   THIN FILMS DEPOSITED BY BIAS SPUTTERING [J].
MAISSEL, LI ;
SCHAIBLE, PM .
JOURNAL OF APPLIED PHYSICS, 1965, 36 (01) :237-&