MODIFICATION OF THIN-FILM PROPERTIES BY ION-BOMBARDMENT DURING DEPOSITION

被引:56
作者
HARPER, JME [1 ]
CUOMO, JJ [1 ]
GAMBINO, RJ [1 ]
KAUFMAN, HR [1 ]
机构
[1] COLORADO STATE UNIV,DEPT PHYS,FT COLLINS,CO 80523
关键词
D O I
10.1016/0168-583X(85)90489-6
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
收藏
页码:886 / 892
页数:7
相关论文
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