DC BIAS-SPUTTERED ALUMINUM FILMS

[1] STRESS AND RESISTIVITY CONTROL IN SPUTTERED MOLYBDENUM FILMS AND COMPARISON WITH SPUTTERED GOLD [J]. METALLURGICAL TRANSACTIONS, 1971, 2 (03): : 699 - &

[2] Castro P. L., 1969, Ohmic contacts to semiconductors, P332

[3] CHALMERS B, 1959, PHYSICAL METALLURGY, P332

[4] COOK HC, 1966, T METALL SOC AIME, V236, P314

[5] DHEURLE F, 1968, T METALL SOC AIME, V242, P502

[6] ALUMINUM FILMS DEPOSITED BY RF SPUTTERING [J]. METALLURGICAL TRANSACTIONS, 1970, 1 (03): : 725 - &

[7] INTRINSIC STRESS IN EVAPORATED METAL FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (01): : 138 - &

[8] SPUTTERING YIELDS OF METALS FOR AR+ AND NE+ IONS WITH ENERGIES FROM 50 TO 600 EV [J]. JOURNAL OF APPLIED PHYSICS, 1961, 32 (03) : 365 - &

[9] THIN FILMS DEPOSITED BY BIAS SPUTTERING [J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (01) : 237 - &

[10] RESISTIVITY AND STRUCTURE OF EVAPORATED ALUMINUM FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (04): : 690 - +

[1] STRESS AND RESISTIVITY CONTROL IN SPUTTERED MOLYBDENUM FILMS AND COMPARISON WITH SPUTTERED GOLD [J]. METALLURGICAL TRANSACTIONS, 1971, 2 (03): : 699 - &

[2] Castro P. L., 1969, Ohmic contacts to semiconductors, P332

[3] CHALMERS B, 1959, PHYSICAL METALLURGY, P332

[4] COOK HC, 1966, T METALL SOC AIME, V236, P314

[5] DHEURLE F, 1968, T METALL SOC AIME, V242, P502

[6] ALUMINUM FILMS DEPOSITED BY RF SPUTTERING [J]. METALLURGICAL TRANSACTIONS, 1970, 1 (03): : 725 - &

[7] INTRINSIC STRESS IN EVAPORATED METAL FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (01): : 138 - &

[8] SPUTTERING YIELDS OF METALS FOR AR+ AND NE+ IONS WITH ENERGIES FROM 50 TO 600 EV [J]. JOURNAL OF APPLIED PHYSICS, 1961, 32 (03) : 365 - &

[9] THIN FILMS DEPOSITED BY BIAS SPUTTERING [J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (01) : 237 - &

[10] RESISTIVITY AND STRUCTURE OF EVAPORATED ALUMINUM FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (04): : 690 - +