Electron-beam-induced deposition with carbon nanotube emitters

被引：95

作者：

Dong, LX ^{[1
]}

Arai, F ^{[1
]}

Fukuda, T ^{[1
]}

机构：

[1] Nagoya Univ, Dept Micro Syst Engn, Nagoya, Aichi 4648603, Japan

来源：

APPLIED PHYSICS LETTERS | 2002年 / 81卷 / 10期

关键词：

D O I：

10.1063/1.1504486

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Electron-beam-induced deposition (EBID) is performed with multiwalled carbon nanotube emitters that are assembled to atomic force microscope cantilevers through nanorobotic manipulations. A typical experiment shows that under 120 V bias, field emission current 2 muA occurs from a nanotube emitter. In comparison with conventional EBID with a Schottky-type electron gun of a field-emission scanning electron microscope (FESEM) in the same vacuum chamber, the deposition rate of the nanotube emitter reaches up to 12.2% of that of FESEM although the bias and the emission current are only 0.8% and 1.9% of those of FESEM (15 kV and 106 muA). The concept of parallel EBID is also presented. (C) 2002 American Institute of Physics.

引用

页码：1919 / 1921

页数：3

共 18 条

[1] A MULTIPLE-ELECTRON-BEAM EXPOSURE SYSTEM FOR HIGH-THROUGHPUT, DIRECT-WRITE SUBMICROMETER LITHOGRAPHY [J].

BRODIE, I ;

WESTERBERG, ER ;

CONE, DR ;

MURAY, JJ ;

WILLIAMS, N ;

GASIOREK, L .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1981, 28 (11) :1422-1428

[2] ELECTRON-BEAM FABRICATION OF 80-A METAL STRUCTURES [J].

BROERS, AN ;

MOLZEN, WW ;

CUOMO, JJ ;

WITTELS, ND .

APPLIED PHYSICS LETTERS, 1976, 29 (09) :596-598

[3] Exploiting the properties of carbon nanotubes for nanolithography [J].

Dai, HJ ;

Franklin, N ;

Han, J .

APPLIED PHYSICS LETTERS, 1998, 73 (11) :1508-1510

[4] A CARBON NANOTUBE FIELD-EMISSION ELECTRON SOURCE [J].

DEHEER, WA ;

CHATELAIN, A ;

UGARTE, D .

SCIENCE, 1995, 270 (5239) :1179-1180

[5]

Dong LX, 2001, IEEE INT CONF ROBOT, P632, DOI 10.1109/ROBOT.2001.932621

[6]

DONG LX, 2001, J ROBO MECH, V13, P534

[7] Self-oriented regular arrays of carbon nanotubes and their field emission properties [J].

Fan, SS ;

Chapline, MG ;

Franklin, NR ;

Tombler, TW ;

Cassell, AM ;

Dai, HJ .

SCIENCE, 1999, 283 (5401) :512-514

[8] INVESTIGATIONS OF ARTIFICIAL NANOSTRUCTURES AND LITHOGRAPHY TECHNIQUES WITH A SCANNING PROBE MICROSCOPE [J].

GRIESINGER, UA ;

KADEN, C ;

LICHTENSTEIN, N ;

HOMMEL, J ;

LEHR, G ;

BERGMANN, R ;

MENSCHIG, A ;

SCHWEIZER, H ;

HILLMER, H ;

KOOPS, HWP ;

KRETZ, J ;

RUDOLPH, M .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06) :2441-2445

[9] HIGH-RESOLUTION ELECTRON-BEAM INDUCED DEPOSITION [J].

KOOPS, HWP ;

WEIEL, R ;

KERN, DP ;

BAUM, TH .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (01) :477-481

[10] CHARACTERIZATION AND APPLICATION OF MATERIALS GROWN BY ELECTRON-BEAM-INDUCED DEPOSITION [J].

KOOPS, HWP ;

KRETZ, J ;

RUDOLPH, M ;

WEBER, M ;

DAHM, G ;

LEE, KL .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (12B) :7099-7107

← 1 2 →