Chemical nano-patterning using hot embossing lithography

被引：29

作者：

Schift, H ^{[1
]}

Heyderman, LJ ^{[1
]}

Padeste, C ^{[1
]}

Gobrecht, J ^{[1
]}

机构：

[1] Paul Scherrer Inst, Lab Micro & Nanotechnol, CH-5232 Villigen, Switzerland

来源：

MICROELECTRONIC ENGINEERING | 2002年 / 61-2卷

关键词：

hot embossing; nanoimprint lithography; chemical contrast; replication;

D O I：

10.1016/S0167-9317(02)00513-0

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We demonstrate the patterning of silanes on silicon substrates using hot embossing and lift-off. Periodic structures with feature sizes < 500 nm have been replicated. We are expecting this method to be easily applicable for a range of different chemicals and for structure sizes down to 100 run. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：423 / 428

页数：6

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