X-ray photoelectron spectroscopy analyses of titanium oxynitride films prepared by magnetron sputtering using air/Ar mixtures

被引：82

作者：

Chan, Mu-Hsuan ^{[1
]}

Lu, Fu-Hsing ^{[1
]}

机构：

[1] Natl Chung Hsing Univ, Dept Mat Sci & Engn, Taichung 402, Taiwan

来源：

THIN SOLID FILMS | 2009年 / 517卷 / 17期

关键词：

Titanium oxynitride films; Air; Sputtering; X-ray photoelectron spectroscopy (XPS); THIN-FILMS; NITRIDE; COATINGS;

D O I：

10.1016/j.tsf.2009.03.100

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

X-ray photoelectron spectroscopy (XPS) has been employed to investigate titanium oxynitride (TiNxOy) films prepared by d.c. magnetron sputtering using air/Ar mixtures, which allows one to perform the deposition at a high base pressure (1.3 x 10(-2) Pa) and can reduce substantially the processing time. XPS analyses revealed that all the prepared TiNxOy films comprised Ti-N, Ti-N-O, and Ti-O chemical states. When the air/Ar ratio was below 0.3, nitrogen-rich TiNxOy films were obtained. As the air/Ar ratio was above 0.4, oxygen-rich TiNxOy films were formed. XPS depth profile analyses were also performed in selected specimens. It has been found that at relatively low air/Ar ratios, such as 0.5, the oxygen content of the films increased toward the film/substrate interface and when the air/Ar ratio was higher. TiNxOy films with large oxygen content with uniform concentrations were then formed. (c) 2009 Elsevier B.V. All rights reserved.

引用

页码：5006 / 5009

页数：4

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